Ö. Ebil, "Hot-Wire Chemical Vapor Deposition of Organic...", Dec. 26
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  • Ö. Ebil, "Hot-Wire Chemical Vapor Deposition of Organic...", Dec. 26

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Faculty of Engineering and Natural Sciences
FENS MAT 551 SEMINARS

 

Hot-Wire Chemical Vapor Deposition (HW-CVD) of Organic and Inorganic Thin Films: Mechanism and Applications

Özgenç Ebil
NanoSelect Inc. in Newark, DE,
ozgenc.ebil@gmail.com

Hot-Wire or Hot-Filament Chemical Vapor Deposition is a relatively new technique initially developed for the deposition of diamond. HW-CVD is now becoming a mature technique in the field of thin silicon film deposition. In recent years, HW-CVD attracted both academic and industrial interest since it overcomes some of the limitations of PECVD technology and offers additional advantages such as the absence of ion bombardment during deposition, high deposition rates, low equipment implementation and upkeep costs, high gas utilization and easy scalability to large areas.  In Hot-Wire CVD, the deposition takes place upon catalytic or thermal decomposition of the reactant gases at the surface of a heated filament. Diamond, amorphous and polycrystalline silicon, SiGe and SiNx thin-films have been successfully deposited using HW-CVD.

Initiated chemical vapor deposition (iCVD) is a subset of HWCVD developed for polymeric thin films.  It is able to deposit thin films of application-specific polymers in one step without using any solvents. Its uniqueness of in situ surface polymer synthesis distinguishes iCVD from conventional processes such as spin-on deposition and PECVD. iCVD differs from conventional HWCVD on one main count—using an initiator to allow a greater degree of control over process and coating properties. iCVD allows films of nanoscale thicknesses with macroscale uniformity to be produced and can be applied to complex geometries. It can be used to coat nanoscale features, as there are no surface tension and non-uniform wetting effects typically associated with wet processes. Initiation can also be achieved using ultraviolet light for 2D patterning of coatings in flat substrates.

We will show the underlying mechanisms for the deposition of inorganic and organic thin-films using HW-CVD as well as some of the applications of HW-CVD such as fabrication of solar cells, TFTs, large area displays, passivation coating for semiconductor industry, photo-resist application, and functionalization of MEMS devices and sensors.

Wednesday, 26 December 2007 at 13:40, FENS G032